Advances in Imaging and Electron Physics: Volume 164

Features articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science and digital image processing, electromagnetic wave propagation, electron microscopy, and the computing methods used in these domains.

Magnetolithography - from the Bottom-Up Route to High Throughput - Amos Bardea and Ron Naaman The Optics of the Spatial Coherence Wavelets - Roman Castaneda Common Diffraction Integral Calculation Based on Fast Fourier Transform Algorithm - LI Junchang, WU Yanmei and LI Yan A generalized approach to describe the interference contrast and the phase contrast method - Marcel Teschke and Stefan Sinzinger Nonlinear partial differential equations for noise problems - Booyong Choi Harmuth Corrigenda - Henning Harmuth